Anthony J Norell

Title: The Innovative Contributions of Anthony J. Norell

Introduction

Anthony J. Norell is a notable inventor based in Newark, CA, who has made significant contributions to the field of plasma processing technology. With a total of 5 patents to his name, Norell's work focuses on enhancing the efficiency and functionality of plasma processing apparatuses.

Latest Patents

One of Norell's latest patents is the "Showerhead Electrode Assembly with Gas Flow Modification for Extended Electrode Life." This invention provides a showerhead electrode assembly that includes a first member attached to a second member, featuring gas passages that optimize the flow of process gas. The design ensures that the pressure drop across the gas passages is effectively managed, enhancing the longevity of the electrode.

Another significant patent is the "Upper Electrode Backing Member with Particle Reducing Features." This invention addresses the thermal expansion differences between the metallic backing member and the upper electrode. By strategically positioning and sizing the gas passages, Norell's design minimizes non-uniform shear stresses, thereby improving the overall performance of the plasma processing apparatus.

Career Highlights

Anthony J. Norell is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His innovative designs and patents have contributed to advancements in plasma processing technologies, making him a valuable asset to his organization.

Collaborations

Norell has collaborated with talented coworkers such as Anthony De La Llera and Rajinder Dhindsa, further enhancing the innovative environment at Lam Research Corporation.

Conclusion

Anthony J. Norell's contributions to plasma processing technology through his patents and collaborative efforts highlight his role as a significant inventor in the field. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.