HSINCHU COUNTY, Taiwan

Sai-hooi Yeong

USPTO Granted Patents = 12 

Average Co-Inventor Count = 5.2

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2025

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: Innovation in Integrated Circuit Fabrication: The Contributions of Sai-hooi Yeong

Introduction

Sai-hooi Yeong, an accomplished inventor based in Hsinchu County, Taiwan, has made significant strides in the field of integrated circuit fabrication. With a total of three patents to his name, Yeong's work showcases innovative methods and designs that contribute to the advancement of semiconductor technologies.

Latest Patents

Yeong's latest patents exemplify groundbreaking techniques in the creation and enhancement of electronic devices. One notable invention is the "Self-aligned contact air gap formation." This method involves a sophisticated process for fabricating integrated circuits that includes a device structure with various features such as a substrate, source/drain components, and a contact hole that integrates an air gap extending above the gate stack. This innovation enhances device performance by utilizing a meticulous arrangement of elements to minimize interference and optimize electrical connections.

Another of Yeong's significant contributions is the "Ferroelectric memory device and method of forming the same." This invention outlines a unique structure for a ferroelectric memory device, integrating multiple layers including a gate electrode, a ferroelectric layer, and source/drain electrodes. By innovating through the inclusion of insertion layers with varying thicknesses, Yeong's design improves the functionality and efficiency of memory devices, pushing the boundaries of current technology in ferroelectric materials.

Career Highlights

Sai-hooi Yeong has cultivated a successful career at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in the semiconductor industry. His expertise in integrated circuit fabrication continues to drive advancements in the field, with his patents reflecting a commitment to innovation and excellence.

Collaborations

Throughout his career, Yeong has collaborated with esteemed colleagues such as Feng-Cheng Yang and Chia-Ta Yu. These partnerships enrich his work and foster an environment of creativity and innovation, ultimately leading to significant technological advancements within their projects.

Conclusion

As an inventor, Sai-hooi Yeong stands out for his contributions to the field of integrated circuit fabrication. His latest patents not only illustrate his technical prowess but also demonstrate his dedication to pushing the envelope in semiconductor technology. With a strong career at TSMC and collaborative efforts with other talented professionals, Yeong's work is sure to leave a lasting impact on the industry.

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