Sadasivan Shankar

USPTO Granted Patents = 13 (Patent Applications = 2)

Average Co-Inventor Count = 3.8

ph-index = 4

Forward Citations = 38(Granted Patents)

Company Filing History:

Years Active: 2005-2023

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11757026 - Nanowire structures having wrap-around contacts (2023-09-12),

2. 10840366 - Nanowire structures having wrap-around contacts (2020-11-17),

3. 10483385 - Nanowire structures having wrap-around contacts (2019-11-19),

4. 9577057 - Semiconductor device contacts (2017-02-21),

5. 9166004 - Semiconductor device contacts (2015-10-20),

6. 8779589 - Liner layers for metal interconnects (2014-07-15),

7. 8633534 - Transistor channel mobility using alternate gate dielectric materials (2014-01-21),

8. 8154121 - Polymer interlayer dielectric and passivation materials for a microelectronic device (2012-04-10),

9. 7279084 - Apparatus having plating solution container with current applying anodes (2007-10-09),

10. 7021999 - Rinse apparatus and method for wafer polisher (2006-04-04),

11. 6908370 - Rinse apparatus and method for wafer polisher (2005-06-21),

12. 6887131 - Polishing pad design (2005-05-03),

13. 6883153 - Minimization of microelectronic interconnect thickness variations (2005-04-19),

Title: Sadasivan Shankar: Innovator in Nanowire Technology

Introduction

Sadasivan Shankar is a prominent inventor based in Cupertino, CA, known for his significant contributions to nanowire technology. With a total of 13 patents to his name, he has made remarkable advancements in semiconductor devices.

Latest Patents

One of his latest patents focuses on nanowire structures having wrap-around contacts. This innovative design includes a nanowire positioned above a substrate, featuring a channel region with a defined length and perimeter. A gate electrode stack surrounds the entire perimeter of the channel region, while source and drain regions are strategically placed on either side. Each of these regions has a perimeter orthogonal to the channel's length, with contacts that completely surround the perimeters of both the source and drain regions.

Career Highlights

Sadasivan Shankar has had a distinguished career, working with leading technology companies such as Intel Corporation and Google Inc. His work has significantly impacted the field of semiconductor technology, particularly in the development of advanced nanowire devices.

Collaborations

Throughout his career, Sadasivan has collaborated with notable professionals in the industry, including Michael G Haverty and Lei Jiang. These collaborations have further enhanced his innovative contributions to technology.

Conclusion

Sadasivan Shankar's work in nanowire technology exemplifies the spirit of innovation in the semiconductor industry. His patents and collaborations reflect a commitment to advancing technology and improving device performance.

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