IDiyas

For the Inventor, By the Inventor

Hsinchu, Taiwan

Rueijer Lin

USPTO Granted Patents = 24 

Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:

goldMedal24 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2015-2025

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24 patents (USPTO):
1. 12278188 - Different via configurations for different via interface requirements (2025-04-14),
2. 12176435 - Method for forming fin field effect transistor (FinFET) device structure with conductive layer between gate and gate contact (2024-12-24),
3. 12142565 - Different via configurations for different via interface requirements (2024-11-12),
4. 11908697 - Interconnect structure having a carbon-containing barrier layer (2024-02-20),
5. 11855154 - Vertical interconnect features and methods of forming (2023-12-26),
6. 11532561 - Different via configurations for different via interface requirements (2022-12-20),
7. 11527411 - Interconnect structure having a carbon-containing barrier layer (2022-12-13),
8. 11271112 - Method for forming fin field effect transistor (FINFET) device structure with conductive layer between gate and gate contact (2022-03-08),
9. 11107896 - Vertical interconnect features and methods of forming (2021-08-31),
10. 11062909 - Interconnect structure having a carbon-containing barrier layer (2021-07-13),
11. 10867800 - Method of forming an interconnect structure having a carbon-containing barrier layer (2020-12-15),
12. 10840105 - Gate structure with insulating structure and method for manufacturing the same (2020-11-17),
13. 10714329 - Pre-clean for contacts (2020-07-14),
14. 10529575 - Interconnect structure having a carbon-containing barrier layer (2020-01-07),
15. 10505045 - Fin field effect transistor (FinFET) device structure with conductive layer between gate and gate contact (2019-12-10),

Title: Rueijer Lin: Pioneering Inventor from Hsinchu

Introduction: Rueijer Lin is a distinguished inventor hailing from the vibrant city of Hsinchu, Taiwan. With a passion for innovation and a keen eye for technological advancements, Lin has made significant contributions to the field of patents and inventions.

Latest Patents: Lin's latest patents showcase his expertise in cutting-edge technologies, ranging from semiconductor devices to renewable energy solutions. His innovative approach has led to the development of groundbreaking inventions that have the potential to shape the future.

Career Highlights: Throughout his illustrious career, Rueijer Lin has garnered recognition for his groundbreaking inventions and patents. His commitment to pushing the boundaries of technology has earned him a reputation as a visionary in the field of innovation.

Collaborations: Lin has collaborated with leading research institutions, universities, and companies to bring his inventions to life. His ability to work across disciplines and industries has resulted in successful partnerships that have furthered the impact of his work.

Conclusion: Rueijer Lin's dedication to innovation and his relentless pursuit of technological advancement make him a standout figure in the world of inventors. His contributions have not only transformed industries but have also inspired future generations to push the boundaries of what is possible in the realm of patents and inventions.

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