Ronald Anthony DellaGuardia

Title: The Innovations of Ronald Anthony DellaGuardia

Introduction

Ronald Anthony DellaGuardia, an accomplished inventor from Poughkeepsie, NY, has made significant contributions to the field of microelectronics. With a remarkable portfolio of 13 patents, DellaGuardia's work primarily focuses on improving interconnect structures within integrated circuits, which are crucial for enhancing device performance and reliability.

Latest Patents

DellaGuardia's latest patents demonstrate his inventive prowess. One notable patent is a "Method to remove beol sacrificial materials and chemical residues by irradiation." This innovative approach fabricates interconnect structures by utilizing irradiation to effectively remove and clean sacrificial materials. The method stands out as it minimizes damage to interlayer dielectric layers, thereby enhancing device performance and increasing reliability.

Another recent patent is the "Selective thin metal cap process," which involves the creation of metal caps on copper lines within an inter-line dielectric. This process includes depositing a thin blanket film of metal, such as Ta/TaN, over the copper lines and dielectric after planarization. The unique feature of this method is that a lithographic mask is not required, as the reflectivity difference between copper and the underlying dielectric results in a self-aligned mask pattern for etching away the metal cap.

Career Highlights

Ronald DellaGuardia has worked with prominent organizations, including the International Business Machines Corporation (IBM) and Shipley Company, L.L.C. His roles in these companies have allowed him to push the boundaries of technology in the microelectronics sector, solidifying his reputation as an innovative thinker.

Collaborations

Throughout his career, DellaGuardia has collaborated with esteemed colleagues such as Hiroshi Ito and Kuang-Jung Chen. These partnerships have undoubtedly contributed to the advancements in the methods and technologies he has developed, illustrating the power of teamwork in the innovation process.

Conclusion

Ronald Anthony DellaGuardia's contributions to microelectronics through his patents have paved the way for enhanced performance and reliability in integrated circuits. His innovative methods, along with his collaborations, highlight the importance of continual improvement in technology. As he continues to explore new frontiers in his field, DellaGuardia remains an influential figure in the world of inventions.