The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2000
Filed:
Feb. 25, 1998
Kuang-Jung Chen, Poughkeepsie, NY (US);
Ronald A DellaGuardia, Poughkeepsie, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Ahmad D Katnani, Poughkeepsie, NY (US);
Mahmoud M Khojasteh, Poughkeepsie, NY (US);
Qinghuang Lin, Wappingers Falls, NY (US);
International Business Machines Corp., Armonk, NY (US);
Abstract
The present invention is directed to a high-performance irradiation sensitive positive-tone resist and to a method of formulating the same. In one aspect, the polymer resin composition of the present invention comprises a blend of at least two miscible aqueous base soluble polymer resins, wherein one of said aqueous base soluble polymer resins of said blend is partially protected with a high activation energy protecting group and the other aqueous base soluble polymer resin of said blend is partially protected with a low activation energy protecting group. A chemically amplified resist system comprising said polymer resin composition; at least one acid generator; and a solvent is also provided herein.