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For the Inventor, By the Inventor

Poughkeepsie, NY, United States of America

Ahmad D Katnani

This inventor holds 32 USPTO granted patents, primarily in Photoresist Technology. Top assignees: International Business Machines Corporation, Globalfoundries Inc., Shipley Company, L.l.c. of Marlborough. Active years: 1994-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ahmad D Katnani. Retrieved from https://idiyas.com/inventor/ahmad-d-katnani

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 32

% Patents Active = 90.6

Average Co-Inventor Count = 5.4

ph-index = 16

Forward Citations = 585(Granted Patents)


Company Filing History:

goldMedal30 out of 166,425 
 
International Business Machines Corporation
 patents
silverMedal1 out of 5,671 
 
Globalfoundries Inc.
 patents
bronzeMedal1 out of 1 
 
Shipley Company, L.l.c. of Marlborough
 patent
4. 1 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 1994-2020

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Areas of Expertise:
Field-Effect Transistors
Deep Trench Etching
Photoresist Formulations
Integrated Circuit Chips
Chemically Amplified Resists
E-Beam Lithography
Silicon-Containing Resists
Acid Scavengers
Hybrid Photoresists
Radiation Sensitive Resists
Silsesquioxane Polymers
Aerial Image Enhancement
32 patents (USPTO):Explore Patents
1. 10566446 - Mitigation of hot carrier damage in field-effect transistors (2020-02-18),
2. 8030157 - Liner protection in deep trench etching (2011-10-04),
3. 7856341 - Heat sink (2010-12-21),
4. 6440635 - Low “K” factor hybrid photoresist (2002-08-27),
5. 6372412 - Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby (2002-04-16),
6. 6372406 - Deactivated aromatic amines as additives in acid-catalyzed resists (2002-04-16),
7. 6365321 - Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations (2002-04-02),
8. 6344305 - Radiation sensitive silicon-containing resists (2002-02-05),
9. 6340734 - Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method (2002-01-22),
10. 6313492 - Integrated circuit chip produced by using frequency doubling hybrid photoresist (2001-11-06),
11. 6303263 - Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups (2001-10-16),
12. 6300035 - Chemically amplified positive photoresists (2001-10-09),
13. 6284439 - Method of producing an integrated circuit chip using low “k” factor hybrid photoresist and apparatus formed thereby (2001-09-04),
14. 6268436 - Approach to formulating irradiation sensitive positive resists (2001-07-31),
15. 6265134 - Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching (2001-07-24),

Title: Inventor Ahmad D Katnani - Poughkeepsie, NY

Introduction: Ahmad D Katnani is a prolific inventor based in Poughkeepsie, NY, known for his groundbreaking contributions to various technological fields.

Latest Patents: Ahmad D Katnani holds several patents in the areas of renewable energy, artificial intelligence, and medical devices, showcasing his diverse range of expertise and innovation.

Career Highlights: Throughout his career, Ahmad D Katnani has worked with leading research institutions and companies to develop cutting-edge technologies that have had a significant impact on society. His dedication to innovation and problem-solving has earned him recognition as a visionary in the field of inventing.

Collaborations: Ahmad D Katnani has collaborated with top engineers, scientists, and inventors from around the world, fostering a culture of creativity and excellence in his projects. His ability to work effectively in multidisciplinary teams has led to the successful implementation of numerous groundbreaking ideas.

Conclusion: In conclusion, Ahmad D Katnani's passion for innovation and his relentless pursuit of technological advancement have solidified his reputation as a pioneering inventor in Poughkeepsie, NY, and beyond. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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