The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2001
Filed:
Feb. 25, 1998
Kuang-Jung Chen, Poughkeepsie, NY (US);
Ronald A. DellaGuardia, Poughkeepsie, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Ahmad D. Katnani, Poughkeepsie, NY (US);
Mahmoud M. Khojasteh, Poughkeepsie, NY (US);
Qinghuang Lin, Wappingers Falls, NY (US);
International Business Machines Machines, Armonk, NY (US);
Abstract
The present invention is directed to a high-performance irradiation sensitive resists and to a polymer resin composition useful for making the same. In accordance to the present invention, the polymer resin comprises a dual blocked polymer resins. Specifically, the dual blocked polymer resin comprises at least two different acid labile protecting groups which block some, but not all, of the polar functional groups of the polymer resin. a chemically amplified resist system comprising said dual blocked polymer resin; at least one acid generator; and a solvent is also provided herein.