The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2002
Filed:
Feb. 10, 1998
Mark C. Hakey, Milton, VT (US);
Steven J. Holmes, Milton, VT (US);
David V. Horak, Essex Junction, VT (US);
Ahmad D. Katnani, Poughkeepsie, NY (US);
Niranjan M. Patel, Wappingers Falls, NY (US);
Paul A. Rabidoux, Winooski, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A photoresist composition is disclosed having both negative tone and positive tone responses, giving rise to spaces being formed in the areas of diffraction which are exposed to intermediate amounts of radiation energy. This resist material may be used to print doughnut shapes or may be subjected to a second masking step, to print lines. Additionally, larger and smaller features may be obtained using a gray-scale filter in the reticle, to create larger areas of intermediate exposure areas.