The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1999
Filed:
Jun. 11, 1996
George G Barclay, Allston, MA (US);
Michael F Cronin, Franklin, MA (US);
Ronald A Dellaguardia, Poughkeepsie, NY (US);
James W Thackeray, Braintree, MA (US);
Hiroshi Ito, San Jose, CA (US);
Greg Breyta, San Jose, CA (US);
Shipley Company, L.L.C., Marlborough, MA (US);
IBM Corporation, Armonk, NY (US);
Abstract
The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.