The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Feb. 21, 2007
Qinghuang Lin, Yorktown Heights, NY (US);
Elbert E. Huang, Tarrytown, NY (US);
Christy S. Tyberg, Mahopac, NY (US);
Ronald A. Dellaguardia, Poughkeepsie, NY (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Elbert E. Huang, Tarrytown, NY (US);
Christy S. Tyberg, Mahopac, NY (US);
Ronald A. DellaGuardia, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method to fabricate interconnect structures that are part of integrated circuits and microelectronic devices by utilization of an irradiation to remove and clean a sacrificial material used therein is described. The advantages of utilizing the irradiation to remove the sacrificial material include reduced damage to interlayer dielectric layers that result in enhanced device performance and/or increased reliability.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile