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Deurne, Netherlands

Remco Dirks

USPTO Granted Patents = 9 

Average Co-Inventor Count = 3.5

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:

goldMedal9 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2014-2024

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9 patents (USPTO):
1. 11994806 - Metrology method and apparatus, computer program and lithographic system (2024-05-28),
2. 11556060 - Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus (2023-01-17),
3. 11429763 - Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method (2022-08-30),
4. 11392043 - Method and metrology apparatus for determining estimated scattered radiation intensity (2022-07-19),
5. 10627213 - Statistical hierarchical reconstruction from metrology data (2020-04-21),
6. 10592618 - Methods and apparatus for simulating interaction of radiation with structures, metrology methods and apparatus, device manufacturing method (2020-03-17),
7. 10151985 - Process flagging and cluster detection without requiring reconstruction (2018-12-11),
8. 8706455 - Methods and apparatus for calculating electromagnetic scattering properties of a structure using a normal-vector field and for reconstruction of approximate structures (2014-04-22),
9. 8645109 - Methods and apparatus for determining electromagnetic scattering properties and structural parameters of periodic structures (2014-02-04),

Certainly! Here is the article about inventor Remco Dirks:

Title: Innovator Spotlight: Remco Dirks - Revolutionizing Metrology and Calibration Techniques

Introduction:

Remco Dirks, a talented inventor hailing from Deurne, NL, has made significant contributions in the field of metrology with a remarkable portfolio of 9 patents. His innovative approaches have reshaped the way metrology is conducted, particularly in lithographic systems and apparatuses.

Latest Patents:

Among his latest patents is a cutting-edge metrology method and apparatus, computer program, and lithographic system. This method involves a sophisticated approach to reconstruct parameterizations for targets on substrates, utilizing hierarchical priors to impose constraints and optimize cost functions. Additionally, Dirks introduced a hybrid model method that combines coarse models with data-driven corrections for enhanced reconstructions.

Career Highlights:

Remco Dirks is currently affiliated with ASML Netherlands B.V., a renowned leader in the semiconductor industry. His role at ASML has allowed him to spearhead groundbreaking advancements in metrology and calibration technologies, driving innovation within the organization.

Collaborations:

Dirks has collaborated closely with esteemed colleagues such as Seyed Iman Mossavat and Markus Gerardus Martinus Maria Van Kraaij. Together, they have synergized their expertise to develop state-of-the-art solutions for metrology challenges, further solidifying Dirks' reputation as a collaborative and visionary inventor.

Conclusion:

In conclusion, Remco Dirks stands out as a pioneering force in the realm of metrology and lithographic systems, with a rich tapestry of patents that showcase his ingenuity and commitment to technological advancement. His relentless pursuit of excellence and collaborative spirit continue to drive innovation in the field, cementing his legacy as a trailblazing inventor in the industry.

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