The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2018
Filed:
Dec. 13, 2016
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Remco Dirks, Deurne, NL;
Seyed Iman Mossavat, Waalre, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70508 (2013.01); G03F 7/70533 (2013.01); G03F 7/70633 (2013.01); G03F 7/70641 (2013.01); G06F 17/5081 (2013.01);
Abstract
A method including determining one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus, wherein determining the one or more statistical features does not include reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.