IDiyas

For the Inventor, By the Inventor

Singapore, Singapore

Randall Cher Liang Cha

USPTO Granted Patents = 27

Average Co-Inventor Count = 4.1

ph-index = 9

Forward Citations = 294(Granted Patents)


Company Filing History:

goldMedal22 out of 962 
 
Chartered Semiconductor Manufacturing Ltd (corporation)
 patents
silverMedal3 out of 3 
 
Chestnut Springs LLC
 patents
bronzeMedal1 out of 1,016 
 
Globalfoundries Singapore Pte. Ltd.
 patents
4. 1 out of 832,680 
Other
 patents

Years Active: 2001-2023

where 'Filed Patents' based on already Granted Patents

27 patents (USPTO):
1. 11608472 - Method for imparting flame retardancy to a substrate material (2023-03-21),
2. 11326104 - Process for preparing flame retardant compositions (2022-05-10),
3. 10752840 - Flame retardant compositions and processes for preparation thereof (2020-08-25),
4. 8766454 - Integrated circuit with self-aligned line and via (2014-07-01),
5. 7119010 - Integrated circuit with self-aligned line and via and manufacturing method therefor (2006-10-10),
6. 6878623 - Technique to achieve thick silicide film for ultra-shallow junctions (2005-04-12),
7. 6849928 - Dual silicon-on-insulator device wafer die (2005-02-01),
8. 6841441 - Method to produce dual gates (one metal and one poly or metal silicide) for CMOS devices using sputtered metal deposition, metallic ion implantation, or silicon implantation, and laser annealing (2005-01-11),
9. 6780691 - Method to fabricate elevated source/drain transistor with large area for silicidation (2004-08-24),
10. 6727151 - Method to fabricate elevated source/drain structures in MOS transistors (2004-04-27),
11. 6664153 - Method to fabricate a single gate with dual work-functions (2003-12-16),
12. 6613652 - Method for fabricating SOI devices with option of incorporating air-gap feature for better insulation and performance (2003-09-02),
13. 6558994 - Dual silicon-on-insulator device wafer die (2003-05-06),
14. 6472697 - Assorted aluminum wiring design to enhance chip-level performance for deep sub-micron application (2002-10-29),
15. 6468880 - Method for fabricating complementary silicon on insulator devices using wafer bonding (2002-10-22),

Title: Innovations by Randall Cher Liang Cha: A Pioneer in Flame Retardant Technologies

Introduction: Randall Cher Liang Cha is a renowned inventor based in Singapore, SG, recognized for his significant contributions to the field of flame retardancy. With a total of 27 patents to his name, his work demonstrates a commitment to enhancing safety in various materials through innovative chemical solutions.

Latest Patents: Among his latest inventions is a patented method for imparting flame retardancy to substrate materials. This method involves the addition of a specially formulated flame retardant composition, which includes at least one flame retardant salt and a nitrogen-containing compound. Notably, the flame retardant salt utilized in this composition is the ammonium salt of phosphoric acid, particularly water-soluble ammonium polyphosphate (APP). The formulation is carefully designed, containing a total nitrogen ranging from about 5 to 15 weight percent and phosphorus content between 30 and 40 weight percent, based on the total weight of the APP.

Additionally, he has developed a process for preparing these flame retardant compositions, which includes combining the flame retardant salt, nitrogen-containing compound, and optional water in a container and mixing them to achieve a dispersed mixture or solution.

Career Highlights: Randall has an impressive career history, having worked at prominent companies such as Chartered Semiconductor Manufacturing Ltd and Chestnut Springs LLC. His expertise in materials and chemical engineering has enabled him to develop several innovative solutions that meet industrial safety standards.

Collaborations: Throughout his career, Randall has collaborated with various professionals in the industry. Notable coworkers, including Alex See and Yeow Kheng Lim, have contributed to his projects, enhancing the innovation process and broadening the scope of his research and developments.

Conclusion: Randall Cher Liang Cha continues to be a pivotal figure in the development of flame retardant technologies. His extensive patent portfolio not only highlights his innovative capabilities but also underscores the importance of safety in materials technology. As he progresses in his career, further advancements in flame retardancy and related fields can be anticipated.

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