IDiyas

For the Inventor, By the Inventor

Chennai, India

Raman K Nurani

USPTO Granted Patents = 10

Average Co-Inventor Count = 3.8

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:

goldMedal10 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2019-2025

Loading Chart...
10 patents (USPTO):Explore Patents
1. 12468873 - Systems and methods for predicting film thickness using virtual metrology (2025-11-11),
2. 11989495 - Systems and methods for predicting film thickness using virtual metrology (2024-05-21),
3. 11862520 - Systems and methods for predicting film thickness of individual layers using virtual metrology (2024-01-02),
4. 11842910 - Detecting outliers at a manufacturing system using machine learning (2023-12-12),
5. 11187992 - Predictive modeling of metrology in semiconductor processes (2021-11-30),
6. 11088039 - Data management and mining to correlate wafer alignment, design, defect, process, tool, and metrology data (2021-08-10),
7. 10614262 - Method of predicting areas of vulnerable yield in a semiconductor substrate (2020-04-07),
8. 10579769 - Using design proximity index and effect-to-design proximity ratio to control semiconductor processes and achieve enhanced yield (2020-03-03),
9. 10579041 - Semiconductor process control method (2020-03-03),
10. 10481199 - Data analytics and computational analytics for semiconductor process control (2019-11-19),

Title: Innovations of Raman K Nurani

Introduction

Raman K Nurani is a prominent inventor based in Chennai, India. He has made significant contributions to the field of technology, particularly in the area of film deposition processes. With a total of 10 patents to his name, Nurani's work has had a substantial impact on the industry.

Latest Patents

One of his latest patents is titled "Systems and methods for predicting film thickness using virtual metrology." This innovative method involves obtaining sensor data associated with a deposition process performed in a process chamber to deposit film on a substrate's surface. A plurality of physics-based outputs are generated using a transformation function and the sensor data. The transformation function is utilized to estimate site availability for growth at an equilibrium condition for the process chamber or to estimate boundary layer thickness in an equilibrium condition for the process chamber. The physics-based outputs are then mapped to a training set, and a virtual model is trained based on this training set and the sensor data. The virtual model is designed to generate predictive metrology data associated with the film.

Career Highlights

Raman K Nurani is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in the field of materials engineering. His expertise in virtual metrology and film deposition processes has positioned him as a key player in his organization.

Collaborations

Throughout his career, Nurani has collaborated with talented individuals such as Anantha R Sethuraman and Koushik Ragavan. These collaborations have further enhanced his research and development efforts.

Conclusion

Raman K Nurani's contributions to the field of technology through his patents and innovative methods demonstrate his commitment to advancing the industry. His work continues to influence the way film deposition processes are understood and implemented.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…