The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Dec. 01, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Raman K. Nurani, Chennai, IN;
Anantha R. Sethuraman, Palo Alto, CA (US);
Koushik Ragavan, Chennai, IN;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A method for detecting a design-impacting defect in an integrated circuit substrate is disclosed. In one implementation, a controller determines a distribution of intended geometric features in a design window of the integrated circuit substrate based on proximities of a plurality of points of interest in the design window to the intended geometric features. The controller obtains a set of intended contours from the distribution. The controller obtains a set of imaged contours from one or more images of the integrated circuit substrate. The controller compares the set of imaged contours to the set of intended contours to obtain a set of potential design-impacting defects in the intended geometric features. The controller determines a probability that a potential design-impacting defect from the set of potential design-impacting defects is a valid design-impacting defect. The controller takes a corrective action based on the determined probability.