The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 2025

Filed:

Apr. 02, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Debkalpo Das, Chennai, IN;

Raman K. Nurani, Chennai, IN;

Ramachandran Subramanian, Chennai, IN;

Bibhavendra Singh, Lucknow, IN;

Bharath Sundar, Chennai, IN;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/33 (2020.01); G06F 18/214 (2023.01); H01L 21/70 (2006.01);
U.S. Cl.
CPC ...
G06F 30/33 (2020.01); G06F 18/214 (2023.01); H01L 21/702 (2013.01);
Abstract

A method includes obtaining sensor data associated with a deposition process performed in a process chamber to deposit film on a surface of a substrate. A plurality of physics-based outputs are generated using a transformation function and the sensor data. The transformation function is used to at least one of estimate site availability for growth at an equilibrium condition for the process chamber or estimate boundary layer thickness in an equilibrium condition for the process chamber. The physics-based outputs are mapped to a training set and a virtual model is trained based on the training set and the sensor data. The virtual model is trained to generate predictive metrology data associated with the film.


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