The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2019
Filed:
Dec. 01, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Raman K. Nurani, Chennai, IN;
Anantha R. Sethuraman, Palo Alto, CA (US);
Koushik Ragavan, Chennai, IN;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Implementations described herein generally relate to detecting excursions in intended geometric features in an integrated circuit substrate. In one implementation, a method includes determining a set of suspect contours in a design window of the integrated circuit substrate based on proximities of a plurality of points of interest in the design window to intended geometric features. The method further includes obtaining a set of imaged contours from one or more images of a defect-free integrated circuit substrate. The method further includes comparing the set of imaged contours to the set of suspect contours to obtain a set of potential excursions from the imaged contours. The method further includes determining a probability that a potential excursion from the set of potential excursions is a valid excursion. The method further includes taking a corrective action based on the determined probability.