Qiwei Liang

This inventor holds 71 USPTO granted patents and 24 published patent applications and 5 EPO patents, primarily in Semiconductor Processing (CPC class H01L). Top assignees: Applied Materials, Inc., Micro Materials Inc.. Active years: 2001-2026.

USPTO Granted Patents = 71 (Patent Applications = 24)

% Patents Active = 90.1

EPO Patents = 5 (Patent Applications = 9)

Average Co-Inventor Count = 4.4

ph-index = 17

Forward Citations = 2,965(Granted Patents)

Forward Citations (Not Self Cited) = 2,822(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

67 out of 14,418

Applied Materials, Inc.

Years Active: 2001-2026

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Areas of Expertise:

CVD Chamber

Wafer Processing

Graphene Deposition

Gas Delivery System

Chemical Control

Substrate Transfer

Plasma Reactor

Thin Wafer Carrier

Batch Curing Chamber

Ion Beam Etch

Self-Assembled Monolayer

High Pressure Processing

71 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12712162 - BIASABLE ELECTROSTATIC CHUCK (2026-08-18),

2. 12566381 - Chamber and methods of cooling a substrate after baking (2026-03-03),

3. 12288672 - Methods and apparatus for carbon compound film deposition (2025-04-29),

4. 12203171 - Batch curing chamber with gas distribution and individual pumping (2025-01-21),

5. 12198951 - High pressure wafer processing systems and related methods (2025-01-14),

6. 12181801 - Chamber and methods of treating a substrate after exposure to radiation (2024-12-31),

7. 12146219 - Flow control features of CVD chambers (2024-11-19),

8. 12142467 - Self-assembled monolayer deposition from low vapor pressure organic molecules (2024-11-12),

9. 12112972 - Rotating biasable pedestal and electrostatic chuck in semiconductor process chamber (2024-10-08),

10. 11948828 - Pin-less substrate transfer apparatus and method for a processing chamber (2024-04-02),

11. 11899366 - Method and apparatus for post exposure processing of photoresist wafers (2024-02-13),

12. 11756803 - Gas delivery system for high pressure processing chamber (2023-09-12),

13. 11749555 - Semiconductor processing system (2023-09-05),

14. 11725274 - Integrated cluster tool for selective area deposition (2023-08-15),

15. 11682556 - Methods of improving graphene deposition for processes using microwave surface-wave plasma on dielectric materials (2023-06-20),

Title: Qiwei Liang: Pioneering Inventor from Fremont

Introduction: Qiwei Liang is a trailblazing inventor based in Fremont, California. She is known for her innovative contributions to various fields, particularly in the realm of technology and engineering.

Latest Patents: Qiwei Liang holds several patents in the areas of renewable energy technologies, sustainable transportation solutions, and advanced materials science. Her recent patents showcase her commitment to creating a more sustainable and efficient future.

Career Highlights: With a background in mechanical engineering and a passion for problem-solving, Qiwei Liang has had a successful career marked by groundbreaking inventions. Her work has not only garnered recognition within the industry but has also made a significant impact on society as a whole.

Collaborations: Throughout her career, Qiwei Liang has collaborated with leading research institutions, universities, and innovative companies to bring her ideas to life. Her ability to work effectively in multidisciplinary teams has been instrumental in the success of her projects.

Conclusion: Qiwei Liang's dedication to innovation and her relentless pursuit of excellence have solidified her reputation as a pioneering inventor in the technology sector. Her contributions continue to inspire future generations of inventors and engineers.