The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
May. 28, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Qiwei Liang, Fremont, CA (US);
Srinivas D. Nemani, Sunnyvale, CA (US);
Keith Tatseun Wong, Mountain View, CA (US);
Antony K. Jan, Mountain View, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/04 (2006.01); H01L 21/027 (2006.01); H01L 21/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32816 (2013.01); C23C 16/042 (2013.01); H01J 37/32449 (2013.01); H01J 37/32522 (2013.01); H01L 21/0271 (2013.01); H01L 21/32 (2013.01);
Abstract
The present disclosure generally relates to a substrate processing chamber, a substrate processing apparatus, and a substrate processing method for self-assembled monolayer (SAM) deposition of low vapor pressure organic molecules (OM) followed by further substrate processing, such as atomic layer deposition.