Veldhoven, Netherlands

Pieter Jacob Kramer

USPTO Granted Patents = 9 

Average Co-Inventor Count = 3.9

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2012-2019

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9 patents (USPTO):Explore Patents

Title: Pieter Jacob Kramer: Pioneering Innovator in Lithography Technology

Introduction:

Pieter Jacob Kramer, a visionary inventor based in Veldhoven, Netherlands, is renowned for his relentless pursuit of innovation in the field of lithography technology. With a total of 9 patents to his name, Kramer's passion for pushing the boundaries of what is possible has solidified his reputation as a true pioneer in the world of inventions.

Latest Patents:

Among Kramer's latest patents is an "Apparatus operable to perform a measurement operation on a substrate, lithographic apparatus, and method of performing a measurement operation on a substrate," which revolutionizes the process of substrate alignment in lithographic operations. This cutting-edge technology enables precise measurement operations based on selected substrate alignment models, enhancing the overall efficiency and accuracy of the process. Additionally, his patent on alignment modeling and a lithographic apparatus showcases his expertise in optimizing pattern positioning on substrates, further advancing the capabilities of lithography technology.

Career Highlights:

Pieter Jacob Kramer's illustrious career is primarily associated with his invaluable contributions to ASML Netherlands B.V., a prominent leader in the semiconductor equipment industry. Through his innovative mindset and technical prowess, Kramer has significantly impacted the development of advanced lithography systems, setting new standards for precision and performance in the industry. His dedication to innovation and problem-solving has been instrumental in shaping the future of lithography technology.

Collaborations:

Throughout his career, Kramer has had the privilege of collaborating with esteemed colleagues such as Arjan Hubrecht Josef Anna Martens and Martinus Hendrikus Antonius Leenders. Together, they have worked tirelessly to explore new possibilities and drive forward groundbreaking advancements in lithography technology. Their combined expertise and collective efforts have led to the successful implementation of innovative solutions that have revolutionized the industry.

Conclusion:

In conclusion, Pieter Jacob Kramer's exceptional talent, unwavering determination, and collaborative spirit have positioned him as a driving force behind the continuous evolution of lithography technology. His remarkable achievements and groundbreaking patents underscore his status as a true trailblazer in the world of inventions, inspiring future generations of innovators to push the boundaries of what is possible.

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