The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2013

Filed:

Sep. 29, 2010
Applicants:

Kornelis Tijmen Hoekerd, Eindhoven, NL;

Roelof Frederik DE Graaf, Veldhoven, NL;

Hans Jansen, Eindhoven, NL;

Martinus Hendrikus Antonius Leenders, Rhoon, NL;

Antonius Johannus Van Der Net, Tilburg, NL;

Pieter Jacob Kramer, Veldhoven, NL;

Anthonie Kuijper, Best, NL;

Arjan Hubrecht Josef Anna Martens, Valkenburg, NL;

Sandra Van Der Graaf, 's-Hertogenbosch, NL;

Alexandre Viktorovych Padiy, Geldrop, NL;

Inventors:

Kornelis Tijmen Hoekerd, Eindhoven, NL;

Roelof Frederik De Graaf, Veldhoven, NL;

Hans Jansen, Eindhoven, NL;

Martinus Hendrikus Antonius Leenders, Rhoon, NL;

Antonius Johannus Van Der Net, Tilburg, NL;

Pieter Jacob Kramer, Veldhoven, NL;

Anthonie Kuijper, Best, NL;

Arjan Hubrecht Josef Anna Martens, Valkenburg, NL;

Sandra Van Der Graaf, 's-Hertogenbosch, NL;

Alexandre Viktorovych Padiy, Geldrop, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.


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