Asml Netherlands B.v.

Pieter Jacob Kramer

Arjan Hubrecht Josef Anna Martens

Martinus Hendrikus Antonius Leenders

Antonius Johannus Van Der Net

Daan Maurits Slotboom

Anthonie Kuijper

Hans Jansen

Bart Dinand Paarhuis

Nicolaas Ten Kate

Roelof Frederik De Graaf

Martinus Cornelis Maria Verhagen

Erik Henricus Egidius Catharina Eummelen

Richard Joseph Bruls

Laurentius Johannes Adrianus Van Bokhoven

Bauke Jansen

Kornelis Tijmen Hoekerd

Sandra Van Der Graaf

Hubertus Leonardus Franciscus Heusschen

Eric Willem Felix Casimiri

Rogier Sebastiaan Gilijamse

Niels Lammers

Alexandre Viktorovych Padiy

An apparatus and method for performing a measurement operation on a substrate in accordance with one or more substrate alignment models. The one or more substrate alignment models are selected from a plurality of candidate substrate alignment models. The apparatus, which may be a lithographic apparatus, includes an external interface which enables selection of the substrate alignment model(s) and/or alteration of the substrate alignment model(s) prior to the measurement operation.

Apparatus operable to perform a measurement operation on a substrate, lithographic apparatus, and method of performing a measurement operation on a substrate

A method including determining a position of a first pattern in each of a plurality of target portions on a substrate, based on a fitted mathematical model, wherein the first pattern includes at least one alignment mark, wherein the mathematical model is fitted to a plurality of alignment mark displacements (dx, dy) for the alignment marks in the target portions, and wherein the alignment mark displacements are a difference between a respective nominal position of the alignment mark and measured position of the alignment mark; and transferring a second pattern onto each of the target portions, using the determined position of the first pattern in each of the plurality of target portions, wherein the mathematical model includes polynomials Zand Z: Z=rcos(2&#x3b8;) and Z=rsin(2&#x3b8;) in polar coordinates (r, &#x3b8;) or Z=x&#x2212;yand Z=xy in Cartesian coordinates (x, y).

Alignment modeling and a lithographic apparatus and exposure method using the same

Disclosed is an apparatus and method for performing a measurement operation on a substrate in accordance with one or more substrate alignment models. The one or more substrate alignment models are selected from a plurality of candidate substrate alignment models. The apparatus, which may be a lithographic apparatus, includes an external interface which enables selection of the substrate alignment model(s) and/or alteration of the substrate alignment model(s) prior to the measurement operation.

A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.

Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method

A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.

Lithographic apparatus and a method of operating the apparatus

A temperature sensor is provided to measure the temperature of immersion liquid at a position where the immersion liquid is supplied. The reading of this temperature sensor is used to control the magnitude of heat input to the immersion liquid using a heater and/or cooler. A controller is used to calculate the calibration error of the temperature sensor relative to a temperature sensor that is provided upstream. The controller uses readings of the temperature difference between the two temperature sensors at one or more mass flow rates in order to estimate the temperature difference between the two temperature sensors at an infinite mass flow rate. The temperature difference at this infinite mass flow rate is estimated to be the temperature calibration error of the temperature sensor to measure the temperature of immersion liquid at a position where the immersion liquid is supplied relative to the upstream temperature sensor.

Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.

Lithographic apparatus and a method of measuring flow rate in a two phase flow

A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

Fluid temperature control and sensor calibration is disclosed. In an embodiment, a fluid temperature control unit includes a heater configured to heat a first fluid in a first fluid path, a first temperature sensor configured to measure a temperature of the first fluid in the first fluid path, a second temperature sensor configured to measure a temperature of a second fluid in a second fluid path, and a controller configured to control the heater on the basis of the temperature sensed by the first sensor and the temperature sensed by the second sensor.

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Veldhoven, Netherlands

Pieter Jacob Kramer