The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
May. 13, 2015
Asml Netherlands B.v., Veldhoven, NL;
Pieter Jacob Kramer, Veldhoven, NL;
Rogier Sebastiaan Gilijamse, Eindhoven, NL;
Niels Lammers, Sittard, NL;
Daan Maurits Slotboom, Wolphaartsdijk, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method including determining a position of a first pattern in each of a plurality of target portions on a substrate, based on a fitted mathematical model, wherein the first pattern includes at least one alignment mark, wherein the mathematical model is fitted to a plurality of alignment mark displacements (dx, dy) for the alignment marks in the target portions, and wherein the alignment mark displacements are a difference between a respective nominal position of the alignment mark and measured position of the alignment mark; and transferring a second pattern onto each of the target portions, using the determined position of the first pattern in each of the plurality of target portions, wherein the mathematical model includes polynomials Zand Z: Z=rcos(2θ) and Z=rsin(2θ) in polar coordinates (r, θ) or Z=x−yand Z=xy in Cartesian coordinates (x, y).