The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2013

Filed:

May. 12, 2010
Applicants:

Bauke Jansen, Deurne, NL;

Richard Joseph Bruls, Eindhoven, NL;

Hans Jansen, Eindhoven, NL;

Antonius Johannus Van Der Net, Tilburg, NL;

Pieter Jacob Kramer, Veldhoven, NL;

Anthonie Kuijper, Best, NL;

Arjan Hubrecht Josef Anna Martens, Valkenburg, NL;

Eric Willem Felix Casimiri, Veldhoven, NL;

Inventors:

Bauke Jansen, Deurne, NL;

Richard Joseph Bruls, Eindhoven, NL;

Hans Jansen, Eindhoven, NL;

Antonius Johannus Van der Net, Tilburg, NL;

Pieter Jacob Kramer, Veldhoven, NL;

Anthonie Kuijper, Best, NL;

Arjan Hubrecht Josef Anna Martens, Valkenburg, NL;

Eric Willem Felix Casimiri, Veldhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B60R 1/06 (2006.01); G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.


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