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For the Inventor, By the Inventor

San Jose, CA, United States of America

Philippe Schoenborn

This inventor holds 29 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignees: Lsi Logic Corporation, Lsi Corporation, Other. Active years: 1992-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Philippe Schoenborn. Retrieved from https://idiyas.com/inventor/philippe-schoenborn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29

% Patents Active = 96.6

Average Co-Inventor Count = 2.3

ph-index = 13

Forward Citations = 767(Granted Patents)


Location History:

  • San Jose, CA (US) (1992 - 2005)
  • San Mateo, CA (US) (2003 - 2008)

Company Filing History:

goldMedal27 out of 3,715 
 
Lsi Logic Corporation
 patents
silverMedal1 out of 2,353 
 
Lsi Corporation
 patents
bronzeMedal1 out of 834,453 
Other
 patents

Years Active: 1992-2008

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Areas of Expertise:
Photoresist Removal
Trench Planarization
Plasma Processing
Carbon-Doped Silicon Oxide
Integrated Circuit Structures
Via Poisoning Prevention
MOS Structure
Silicon Recess Formation
Etch Residue Removal
Inductively Coupled Plasma
Gradient Doped Profile
Anisotropic Etching
29 patents (USPTO):Explore Patents
1. 7379836 - Method of using automated test equipment to screen for leakage inducing defects after calibration to intrinsic leakage (2008-05-27),
2. 7071113 - Process for removal of photoresist mask used for making vias in low K carbon-doped silicon oxide dielectric material, and for removal of etch residues from formation of vias and removal of photoresist mask (2006-07-04),
3. 6969683 - Method of preventing resist poisoning in dual damascene structures (2005-11-29),
4. 6846569 - Carbon-doped hard mask and method of passivating structures during semiconductor device fabrication (2005-01-25),
5. 6743725 - High selectivity SiC etch in integrated circuit fabrication (2004-06-01),
6. 6713386 - Method of preventing resist poisoning in dual damascene structures (2004-03-30),
7. 6673721 - PROCESS FOR REMOVAL OF PHOTORESIST MASK USED FOR MAKING VIAS IN LOW K CARBON-DOPED SILICON OXIDE DIELECTRIC MATERIAL, AND FOR REMOVAL OF ETCH RESIDUES FROM FORMATION OF VIAS AND REMOVAL OF PHOTORESIST MASK (2004-01-06),
8. 6579777 - Method of forming local oxidation with sloped silicon recess (2003-06-17),
9. 6576404 - Carbon-doped hard mask and method of passivating structures during semiconductor device fabrication (2003-06-10),
10. 6559048 - Method of making a sloped sidewall via for integrated circuit structure to suppress via poisoning (2003-05-06),
11. 6506670 - Self aligned gate (2003-01-14),
12. 6503840 - Process for forming metal-filled openings in low dielectric constant dielectric material while inhibiting via poisoning (2003-01-07),
13. 6350700 - Process for forming trenches and vias in layers of low dielectric constant carbon-doped silicon oxide dielectric material of an integrated circuit structure (2002-02-26),
14. 6062163 - Plasma initiating assembly (2000-05-16),
15. 5902704 - Process for forming photoresist mask over integrated circuit structures (1999-05-11),

Title: Inventor Philippe Schoenborn

Introduction: Philippe Schoenborn is a renowned inventor based in San Jose, California. He is known for his groundbreaking innovations in various fields.

Latest Patents: Philippe Schoenborn holds several patents in the areas of technology, healthcare, and sustainable energy. His most recent patents focus on improving renewable energy sources and enhancing medical devices.

Career Highlights: With a career spanning over two decades, Philippe Schoenborn has worked with leading research institutions and companies to bring his inventions to life. He has a proven track record of turning innovative ideas into successful products.

Collaborations: Throughout his career, Philippe Schoenborn has collaborated with top engineers, scientists, and designers to push the boundaries of technology. His partnerships have led to the development of cutting-edge solutions that have made a significant impact in their respective industries.

Conclusion: Philippe Schoenborn's passion for innovation and his dedication to creating a better future through his inventions have solidified his reputation as a visionary inventor in the field of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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