Location History:
- Schwaebisch Gmuend, DE (2009 - 2011)
- Frankfurt-am-Main, DE (2013)
Company Filing History:
2 out of 461 
1 out of 4,883 
1 out of 1,405 
Years Active: 2009-2013
Certainly! Here is the article about inventor Philipp Bosselmann:
Title: Innovator Spotlight: Philipp Bosselmann
Introduction: Philipp Bosselmann, a highly skilled inventor hailing from Schwaebisch Gmuend, Germany, has made significant contributions to the field of extreme ultraviolet (EUV) illumination systems.
Latest Patents: With a total of 3 patents under his belt, Philipp's latest invention revolves around an EUV illumination system integrated with a sophisticated mechanism for measuring fluctuations in the light source. This innovation involves an intricate setup comprising an EUV light source, an aperture stop, and a sensor arrangement specifically designed to monitor intensity fluctuations and position changes within the EUV light source or its intermediate images.
Career Highlights: Philipp Bosselmann has showcased his expertise at renowned companies such as Carl Zeiss SMT AG and ASML Netherlands B.V. His experience in these esteemed organizations has honed his skills and provided him with a robust foundation in the field of optical technology, particularly in EUV systems.
Collaborations: Throughout his career, Philipp has collaborated with notable professionals in the industry, including Markus Weiss and Axel Scholz. These fruitful collaborations have led to the development of cutting-edge technologies and innovative solutions in the realm of EUV illumination systems.
Conclusion: In conclusion, Philipp Bosselmann's journey as an inventor exemplifies a relentless pursuit of innovation and excellence in the field of optical technology. His contributions to EUV illumination systems have significantly advanced the capabilities of such technologies, paving the way for future advancements in the industry.
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