Carl-zeiss-smt Ag

Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Philipp Bosselmann

Markus Weiss

Axel Scholz

Manfred Maul

Vadim Yevgenyevich Banine

Wolfgang Singer

Johannes Wangler

Martin Antoni

Karl Heinz Schuster

Marcel Dierichs

Roel Moors

Bernd Warm

The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.

EUV illumination system with a system for measuring fluctuations of the light source

There is provided an illumination system that includes (a) a light source that emits light having a wavelength &#x2266;193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.

Illumination system for a wavelength of &#x2266; 193 nm, with sensors for determining an illumination

Growing community of inventors

Schwaebisch Gmuend, Germany

Philipp Bosselmann