The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Apr. 07, 2008
Axel Scholz, Aalen, DE;
Markus Weiss, Aalen, DE;
Manfred Maul, Aalen, DE;
Philipp Bosselmann, Schwaebisch Gmuend, DE;
Axel Scholz, Aalen, DE;
Markus Weiss, Aalen, DE;
Manfred Maul, Aalen, DE;
Philipp Bosselmann, Schwaebisch Gmuend, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.