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For the Inventor, By the Inventor

Haifa, Israel

Pavel Izikson

This inventor holds 13 USPTO granted patents and 2 EPO patents. Top assignees: Kla Tencor Corporation, Kla-Tencor Technologies Corporation, Kla-Tenor Corp.. Active years: 2005-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Pavel Izikson. Retrieved from https://idiyas.com/inventor/pavel-izikson

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.5

ph-index = 7

Forward Citations = 282(Granted Patents)


Company Filing History:

goldMedal6 out of 1,787 
 
Kla Tencor Corporation
 patents
silverMedal6 out of 641 
 
Kla-Tencor Technologies Corporation
 patents
bronzeMedal1 out of 8 
 
Kla-Tenor Corp.
 patents

Years Active: 2005-2020

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13 patents (USPTO):Explore Patents
1. 10649447 - Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers (2020-05-12),
2. 9651943 - Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers (2017-05-16),
3. 9620426 - Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation (2017-04-11),
4. 9606453 - Method and system for providing tool induced shift using a sub-sampling scheme (2017-03-28),
5. 9052709 - Method and system for providing process tool correctables (2015-06-09),
6. 8175831 - Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers (2012-05-08),
7. 8142966 - Substrate matrix to decouple tool and process effects (2012-03-27),
8. 7873585 - Apparatus and methods for predicting a semiconductor parameter across an area of a wafer (2011-01-18),
9. 7804994 - Overlay metrology and control method (2010-09-28),
10. 7679069 - Method and system for optimizing alignment performance in a fleet of exposure tools (2010-03-16),
11. 7310789 - Use of overlay diagnostics for enhanced automatic process control (2007-12-18),
12. 7111256 - Use of overlay diagnostics for enhanced automatic process control (2006-09-19),
13. 6928628 - Use of overlay diagnostics for enhanced automatic process control (2005-08-09),

Title: Pavel Izikson: Innovator in Dynamic Sampling Schemes

Introduction

Pavel Izikson is a notable inventor based in Haifa, Israel. He has made significant contributions to the field of dynamic sampling schemes, particularly in processes involving measurements on wafers. With a total of 13 patents to his name, Izikson's work has advanced the methodologies used in various technological applications.

Latest Patents

One of his latest patents focuses on methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers. This innovative method includes performing measurements on all wafers in at least one lot at all measurement spots. Additionally, it involves determining optimal, enhanced, and reduced sampling schemes, along with thresholds for the dynamic sampling scheme based on measurement results. These thresholds correspond to specific measurement values that dictate which sampling scheme should be utilized during the process.

Career Highlights

Throughout his career, Pavel Izikson has worked with prominent companies in the technology sector, including KLA-Tencor Technologies Corporation and KLA Tencor Corporation. His experience in these organizations has allowed him to refine his expertise in dynamic sampling and measurement processes.

Collaborations

Izikson has collaborated with notable professionals in his field, including John Charles Robinson and Michael E. Adel. These collaborations have contributed to the development of innovative solutions in the realm of wafer measurements.

Conclusion

Pavel Izikson's contributions to the field of dynamic sampling schemes have established him as a key figure in technological innovation. His patents and collaborations reflect a commitment to advancing measurement processes in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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