The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2012

Filed:

Apr. 22, 2008
Applicants:

Pavel Izikson, Haifa, IL;

John Robinson, Austin, TX (US);

Mike Adel, Zichron Ya'akov, IL;

Amir Widmann, Sunnyvale, CA (US);

Dongsub Choi, Sungnam, KR;

Anat Marchelli, Migdal Haemek, IL;

Inventors:

Pavel Izikson, Haifa, IL;

John Robinson, Austin, TX (US);

Mike Adel, Zichron Ya'akov, IL;

Amir Widmann, Sunnyvale, CA (US);

Dongsub Choi, Sungnam, KR;

Anat Marchelli, Migdal Haemek, IL;

Assignee:

KLA-Tencor Corp., San Jose, CA (US);

Attorney:
Int. Cl.
CPC ...
G01N 37/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.


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