The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2007
Filed:
Aug. 24, 2006
Joel L. Seligson, Misgav, IL;
Mark Ghinovker, Migsdale Ha'Emek, IL;
John Robinson, Austin, TX (US);
Pavel Izikson, Haifa, IL;
Michael E. Adel, Zichron, IL;
Boris Simkin, Haifa, IL;
David Tulipman, Haifa, IL;
Vladimir Levinski, Nazareth Ilit, IL;
Joel L. Seligson, Misgav, IL;
Mark Ghinovker, Migsdale Ha'Emek, IL;
John Robinson, Austin, TX (US);
Pavel Izikson, Haifa, IL;
Michael E. Adel, Zichron, IL;
Boris Simkin, Haifa, IL;
David Tulipman, Haifa, IL;
Vladimir Levinski, Nazareth Ilit, IL;
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or 'target diagnostics' from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.