The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Mar. 15, 2007
Michael E. Adel, Zichron Ya'akov, IL;
John Robinson, Austin, TX (US);
Pavel Izikson, Haifa, IL;
Brad Eichelberger, Dillsburg, PA (US);
Amir Widmann, Sunnyvale, CA (US);
Atsuhiko Kato, Tokyo, JP;
Michael E. Adel, Zichron Ya'akov, IL;
John Robinson, Austin, TX (US);
Pavel Izikson, Haifa, IL;
Brad Eichelberger, Dillsburg, PA (US);
Amir Widmann, Sunnyvale, CA (US);
Atsuhiko Kato, Tokyo, JP;
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
A method for optimizing alignment performance in a fleet of exposure systems involves characterizing each exposure system in a fleet of exposure systems to generate a set of distinctive distortion profiles associated with each exposure system. The set of distinctive distortion profiles are stored in a database. A wafer having reference pattern formed thereon is provided for further pattern fabrication and an exposure system is selected from the fleet to fabricate a next layer on the wafer. Linear and higher order parameters of the selected exposure system are adjusted using the distinctive distortion profiles to model the distortion of the reference pattern. Once the exposure system is adjusted, it is used to form a lithographic pattern on the wafer.