Company Filing History:

9 out of 297

Cabot Microelectronics Corporation

patents

8 out of 164,108

International Business Machines Corporation

patents

1 out of 832,680

Other

patents

Years Active: 1985-2016

where 'Filed Patents' based on already Granted Patents

18 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9343330 - Compositions for polishing aluminum/copper and titanium in damascene structures (2016-05-17),

2. 8741009 - Polishing composition containing polyether amine (2014-06-03),

3. 7998335 - Controlled electrochemical polishing method (2011-08-16),

4. 7897061 - Compositions and methods for CMP of phase change alloys (2011-03-01),

5. 7837888 - Composition and method for damascene CMP (2010-11-23),

6. 7585340 - Polishing composition containing polyether amine (2009-09-08),

7. 6841479 - Method of reducing in-trench smearing during polishing (2005-01-11),

8. 6726534 - Preequilibrium polishing method and system (2004-04-27),

9. 6632377 - Chemical-mechanical planarization of metallurgy (2003-10-14),

10. 6503827 - Method of reducing planarization defects (2003-01-07),

11. 6495917 - Method and structure of column interconnect (2002-12-17),

12. 6426558 - Metallurgy for semiconductor devices (2002-07-30),

13. 6355565 - Chemical-mechanical-polishing slurry and method for polishing metal/oxide layers (2002-03-12),

14. 6350393 - Use of CsOH in a dielectric CMP slurry (2002-02-26),

15. 6348076 - Slurry for mechanical polishing (CMP) of metals and use thereof (2002-02-19),

Title: Paul M Feeney: Innovator in Chemical-Mechanical Polishing

Introduction

Paul M Feeney is a notable inventor based in Richmond, Vermont, who has made significant contributions to the field of chemical-mechanical polishing. With a total of 18 patents to his name, Feeney has developed innovative solutions that enhance the polishing processes for various substrates.

Latest Patents

Among his latest patents, Feeney has introduced compositions for polishing aluminum, copper, and titanium in damascene structures. This invention provides a chemical-mechanical polishing composition that includes an oxidizing agent, calcium ion, an organic carboxylic acid, and water, with a pH ranging from about 1.5 to about 7. Additionally, he has developed a polishing composition containing polyether amine, which comprises a polishing component, a liquid carrier, and a polyether amine, aimed at improving the efficiency of the polishing process.

Career Highlights

Feeney has had a distinguished career, working with prominent companies such as Cabot Microelectronics Corporation and International Business Machines Corporation. His work has significantly impacted the industry, particularly in the development of advanced polishing techniques.

Collaborations

Throughout his career, Feeney has collaborated with talented individuals, including Jeffrey Dysard and Sriram Anjur, contributing to the advancement of chemical-mechanical polishing technologies.

Conclusion

Paul M Feeney's innovative work in chemical-mechanical polishing has led to the development of important patents that enhance substrate polishing processes. His contributions continue to influence the industry and pave the way for future advancements.

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3 patents (EPO):

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Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.