The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2010
Filed:
Nov. 13, 2006
Paul M. Feeney, Aurora, IL (US);
Sriram Anjur, Aurora, IL (US);
Jeffrey M. Dysard, St. Charles, IL (US);
Paul M. Feeney, Aurora, IL (US);
Sriram Anjur, Aurora, IL (US);
Jeffrey M. Dysard, St. Charles, IL (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention provides a method of chemically-mechanically polishing a substrate having at least one feature defined thereon, wherein the feature has at least one dimension with a size W, with a chemical-mechanical polishing composition. The polishing composition comprises particles of an abrasive wherein the particles have a mean particle diameter Dwherein the mean particle diameter of the particles satisfies the equation: D>W. The invention further provides a method of preparing the chemical-mechanical polishing composition.