The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Jul. 29, 2009
Applicants:
Jeffrey M. Dysard, St. Charles, IL (US);
Paul M. Feeney, Aurora, IL (US);
Sriram P. Anjur, Aurora, IL (US);
Timothy P. Johns, Naperville, IL (US);
Yun-biao Xin, Petaluma, CA (US);
LI Wang, Aurora, IL (US);
Inventors:
Jeffrey M. Dysard, St. Charles, IL (US);
Paul M. Feeney, Aurora, IL (US);
Sriram P. Anjur, Aurora, IL (US);
Timothy P. Johns, Naperville, IL (US);
Yun-Biao Xin, Petaluma, CA (US);
Li Wang, Aurora, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); B24D 3/02 (2006.01); C09C 1/68 (2006.01); C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a substrate with the aforementioned polishing system.