Aurora, IL, United States of America

Li Wang



Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2009-2014

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2 patents (USPTO):

Title: The Innovative Contributions of Li Wang

Introduction

Li Wang is a prominent inventor based in Aurora, IL (US), known for her significant contributions to the field of chemical-mechanical polishing. With a total of 2 patents, she has made notable advancements in polishing compositions that enhance substrate processing.

Latest Patents

Li Wang's latest patents include a polishing composition containing polyether amine. This inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The method involves chemically-mechanically polishing a substrate using the aforementioned polishing system, showcasing her innovative approach to improving polishing techniques.

Career Highlights

Li Wang is currently employed at Cabot Microelectronics Corporation, where she applies her expertise in developing advanced polishing solutions. Her work has been instrumental in enhancing the efficiency and effectiveness of chemical-mechanical polishing processes.

Collaborations

Li Wang collaborates with esteemed colleagues, including Jeffrey Dysard and Paul M Feeney, contributing to a dynamic team focused on innovation in the polishing industry.

Conclusion

Li Wang's contributions to the field of chemical-mechanical polishing through her patents and work at Cabot Microelectronics Corporation highlight her role as a leading inventor. Her innovative solutions continue to impact the industry positively.

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