Tokyo, Japan

Osamu Nozawa

This inventor holds 108 USPTO granted patents and 18 published patent applications and 3 EPO patents, primarily in Semiconductor Manufacturing (CPC class G03F1-32). Top assignees: Hoya Corporation, Dupont Photomasks, Inc.. Active years: 1998-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Nozawa. Retrieved from https://idiyas.com/inventor/osamu-nozawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 108 

% Patents Active = 87.0

 

Average Co-Inventor Count = 2.4

ph-index = 7

Forward Citations = 276(Granted Patents)

Forward Citations (Not Self Cited) = 235(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Fuchu, JP (2002 - 2011)
  • Shinjku-ku, JP (2015)
  • Shinjuku-ku, JP (2010 - 2017)
  • Tokyo, JP (1998 - 2024)

Company Filing History:


Years Active: 1998-2026

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Areas of Expertise:
Mask Blank
Phase Shift Mask
Transfer Mask
Reflective Mask
Imprint Mold
Semiconductor Device
Manufacturing Method
Photolithography
Mask Design
Device Fabrication
Pattern Transfer
108 patents (USPTO):Explore Patents

Title:

Innovator Extraordinaire: The Ingenious Work of Osamu Nozawa

Introduction:

Osamu Nozawa, a visionary inventor based in Tokyo, JP, has garnered international acclaim for his relentless pursuit of innovation and his unwavering passion for tackling complex challenges in the tech industry. With an impressive portfolio of 103 patents, Nozawa has undoubtedly cemented his status as a trailblazer in the global technological landscape.

Latest Patents:

Among his latest patents are groundbreaking inventions such as the Mask Blank, Method of Manufacturing Imprint Mold, Method of Manufacturing Transfer Mask, Method of Manufacturing Reflective Mask, and Method of Manufacturing Semiconductor Device. These patents describe a revolutionary method involving the lamination of a light shielding film and a hard mask film on a transparent substrate, with specific composition gradients and elemental combinations that set a new standard in the industry.

Career Highlights:

Nozawa has left an indelible mark on the technology sector through his tenure at esteemed companies like Hoya Corporation and Dupont Photomasks, Inc., where he has spearheaded cutting-edge research and development initiatives. His innovative approaches to problem-solving and his ability to think outside the box have fueled his success in creating groundbreaking solutions.

Collaborations:

Throughout his illustrious career, Nozawa has collaborated closely with esteemed colleagues such as Hiroaki Shishido and Hideaki Mitsui, pooling their collective expertise to push the boundaries of technological innovation further. These collaborations have led to the development of transformative inventions that have reshaped the industry landscape.

Conclusion:

In conclusion, Osamu Nozawa's exceptional contributions to the realm of technology underscore his status as a visionary inventor whose creativity knows no bounds. His passion for innovation, coupled with his relentless pursuit of excellence, continues to inspire generations of inventors and researchers worldwide. As he continues to push the envelope of technological advancement, the world eagerly awaits the next pioneering invention from this esteemed innovator.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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