The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2022
Filed:
Nov. 20, 2018
Applicant:
Hoya Corporation, Tokyo, JP;
Inventors:
Assignee:
HOYA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/32 (2012.01);
U.S. Cl.
CPC ...
G03F 1/32 (2013.01);
Abstract
Provided is a mask blank including a phase shift film. The phase shift film is made of a material containing a non-metallic element and silicon and includes first, second, and third layers; refractive indexes n, n, and nof the first, second, and third layers, respectively, at the wavelength of an exposure light satisfy the relations of n<nand n>n; and extinction coefficients k, k, and kof the first, second, and third layers, respectively, at the wavelength of an exposure light satisfy the relation of k>k>k.