IDiyas

For the Inventor, By the Inventor

Yokohama, Japan

Osamu Nagano

USPTO Granted Patents = 17

Average Co-Inventor Count = 1.5

ph-index = 6

Forward Citations = 178(Granted Patents)


Location History:

  • Kanagawa, JP (2005 - 2009)
  • Yokohama, JP (1993 - 2013)

Company Filing History:

goldMedal13 out of 52,711 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal3 out of 1,297 
 
Asahi Kasei Kogyo Kabushiki Kaisha
 patents
bronzeMedal1 out of 942 
 
Asahi Kasei Kabushiki Kaisha
 patents

Years Active: 1993-2013

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17 patents (USPTO):Explore Patents
1. 8357895 - Defect inspection apparatus, defect inspection method, and semiconductor device manufacturing method (2013-01-22),
2. 8121390 - Pattern inspection method, pattern inspection apparatus and semiconductor device manufacturing method (2012-02-21),
3. 8090186 - Pattern inspection apparatus, pattern inspection method, and manufacturing method of semiconductor device (2012-01-03),
4. 7692163 - Charged particle beam apparatus, defect correcting method, etching method, deposition method, and charge preventing method (2010-04-06),
5. 7640138 - Interconnection pattern inspection method, manufacturing method of semiconductor device and inspection apparatus (2009-12-29),
6. 7491945 - Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device (2009-02-17),
7. 7304320 - Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device (2007-12-04),
8. 7109501 - Charged particle beam lithography system, pattern drawing method, and method of manufacturing semiconductor device (2006-09-19),
9. 7095023 - Charged particle beam apparatus, charged particle detection method, and method of manufacturing semiconductor device (2006-08-22),
10. 7087551 - Catalyst for use in catalytic oxidation or ammoxidation of propane or isobutane in the gaseous phase (2006-08-08),
11. 7047154 - Interconnection pattern inspection method, manufacturing method of semiconductor device and inspection apparatus (2006-05-16),
12. 6940080 - Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor device (2005-09-06),
13. 6815698 - Charged particle beam exposure system (2004-11-09),
14. 6563308 - Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium (2003-05-13),
15. 5728894 - Method for producing methacrolein (1998-03-17),
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