The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2006

Filed:

Jan. 12, 2004
Applicant:

Osamu Nagano, Kanagawa, JP;

Inventor:

Osamu Nagano, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 13/02 (2006.01); G01B 5/02 (2006.01); G01B 7/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of inspecting an interconnection pattern formed by depositing a metal onto a substrate having an interconnection pattern groove formed on a surface thereof includes: selectively measuring a thickness of a part above the substrate of a metal film formed on the substrate, the part above the substrate being a part constituted of the metal deposited upward from substantially the same surface as the surface of the substrate on which an interconnection pattern groove is formed; and evaluating how successfully the interconnection pattern groove is filled with the metal on the basis of a film thickness value obtained by the selective measurement.


Find Patent Forward Citations

Nagano, Osamu. (2006). Interconnection pattern inspection method, manufacturing method of semiconductor device and inspection apparatus (U.S. Patent No. 7047154). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7047154

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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