The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7692163 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 06, 2010

Filed:

Jan. 25, 2007
Applicant:

Osamu Nagano, Yokohama, JP;

Inventor:

Osamu Nagano, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A charged particle beam apparatus includes a column, the column having: a charged particle beam source which generates a charged particle beam to apply a charged particle beam to the surface of a substrate, a position where the charged particle beam is irradiated to the substrate being a beam position; and a gas mechanism provided in proximity to the substrate to supply a gas to the surface of the substrate, the gas mechanism having an opening which permits passage of the charged particle beam, a gas supply opening which locally injects the gas to the vicinity of the beam position, and a gas exhaust opening which exhausts the injected gas in the vicinity of the beam position to exhaust the gas.


Find Patent Forward Citations

Nagano, Osamu. (2010). Charged particle beam apparatus, defect correcting method, etching method, deposition method, and charge preventing method (U.S. Patent No. 7692163). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7692163

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…