The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Jul. 24, 2008
Osamu Nagano, Yokohama, JP;
Osamu Nagano, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern inspection method includes scanning a substrate on which patterns are formed with a charged beam, detecting a charged particle generated from the surface of the substrate, and then acquiring an image of the patterns; comparing the image of the patterns with CAD data for the patterns to inspect the patterns; measuring the dimensions of an arbitrary pattern using the image; calculating a statistic of a dimensional value of the arbitrary pattern obtained by the measurement; judging the necessity of a correction on the basis of the calculated statistic; and performing correction processing when the correction is judged to be necessary.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile