Location History:
- Kumamoto-ken, JP (2002 - 2004)
- Kikuyo-Machi, JP (2003 - 2005)
- Kikuchi-gun, JP (2003 - 2006)
- Kumamoto, JP (1997 - 2007)
Company Filing History:
16 out of 10,341 
2 out of 85 
Years Active: 1997-2007
Title: Nobukazu Ishizaka: Innovator in Substrate Processing Technologies
Introduction
Nobukazu Ishizaka is a prominent inventor based in Kikuchi-gun, Japan. He has made significant contributions to the field of substrate processing, holding a total of 16 patents. His innovative approaches have advanced the technology used in various industrial applications.
Latest Patents
Ishizaka's latest patents include a substrate processing method and a substrate processing system. The substrate processing method involves coating a coating solution on the surface of the substrate while moving a discharge nozzle and the substrate relative to each other. This method allows for the application of the coating solution, followed by exposure to a solvent atmosphere or temporary pressure application to dry the coating solution effectively. This innovation aims to narrow the edge cutting width at the periphery of the substrate while maintaining uniformity in the coating film. Additionally, his coating film forming apparatus is designed to apply a coating solution to a substrate using a cassette section, coating unit, and various treatment units. This apparatus includes a reduced-pressure drying section to ensure optimal drying conditions for the substrate after coating.
Career Highlights
Throughout his career, Ishizaka has worked with notable companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to refine his skills and contribute to the development of advanced substrate processing technologies.
Collaborations
Ishizaka has collaborated with talented individuals in his field, including Takahiro Kitano and Masateru Morikawa. These collaborations have fostered innovation and the sharing of ideas, further enhancing the impact of his work.
Conclusion
Nobukazu Ishizaka is a distinguished inventor whose work in substrate processing has led to significant advancements in the industry. His patents reflect a commitment to innovation and excellence, making him a key figure in the field.