The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2003

Filed:

Dec. 14, 2000
Applicant:
Inventors:

Takahiro Kitano, Kikuchi-gun, JP;

Masateru Morikawa, Kikuchi-gun, JP;

Yukihiko Esaki, Kikuchi-gun, JP;

Nobukazu Ishizaka, Kikuchi-gun, JP;

Norihisa Koga, Kikuchi-gun, JP;

Kazuhiro Takeshita, Kikuchi-gun, JP;

Hirofumi Ookuma, Kikuchi-gun, JP;

Masami Akimoto, Kikuchi-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 1/110 ;
U.S. Cl.
CPC ...
B05C 1/110 ;
Abstract

An apparatus includes a holding portion for holding a substrate, a nozzle, provided to face the substrate held by the holding portion, for discharging a solution to the substrate, a driver for moving the nozzle along a surface of the substrate relatively with respect to the substrate while the solution is being discharged to the surface of the substrate from the nozzle, a mask unit covering a portion other than a film formation area of the substrate and including a mask member for catching the solution from the nozzle, and a cleaner provided in the mask unit. The coating solution can be supplied to the surface of the substrate in a way similar to a picture drawn with a single stroke of a brush. A cleaning unit for cleaning the mask member does not need to be provided separately, leading to the facilitation of cleaning and a reduction in space.


Find Patent Forward Citations

Loading…