Kanagawa, Japan

Noboru Morita

This inventor holds 21 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Nec Electronics Corporation, Fujitsu Corporation, Nec Corporation. Active years: 2005-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noboru Morita. Retrieved from https://idiyas.com/inventor/noboru-morita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 23.8

Average Co-Inventor Count = 3.9

ph-index = 7

Forward Citations = 114(Granted Patents)


Location History:

  • Kanagawa, JP (2006 - 2010)
  • Kawasaki, JP (2005 - 2012)

Company Filing History:


Years Active: 2005-2012

Loading Chart...
Areas of Expertise:
Semiconductor Device
Manufacturing Method
Carbon Film
Plasma-Enhanced CVD
Fourier Transform
Insulating Film
Data Acquisition
Arithmetic Circuit
Ashing Tolerance
Lookup Table
Silicon Oxide
Communication System
21 patents (USPTO):Explore Patents

Title: Noboru Morita: A Pioneer in Communication and Semiconductor Technologies

Introduction

Noboru Morita, a distinguished inventor based in Kanagawa, Japan, has made significant contributions to the fields of communication devices and semiconductor manufacturing. With a remarkable portfolio of 21 patents, Morita's innovative spirit is evident through his latest creations that enhance technological efficiency and effectiveness.

Latest Patents

Among Morita's most recent patents is a sophisticated communication device and communication system. This device integrates a storage unit that holds a predetermined eye mask pattern, which defines a receivable range for data transmission. It features a receiving unit for incoming data, a waveform comparing unit that assesses the waveform against the eye mask, and a transmission unit that relays the comparison results to another device.

Another notable patent involves a novel method of manufacturing semiconductor devices. This innovation focuses on a barrier film that exhibits a high etching selection ratio against interlayer insulating films, while effectively preventing copper diffusion. Morita's design incorporates a layered barrier film made from silicon and carbon with variable compositions, thereby enhancing adhesion to copper interconnections and reducing the overall dielectric constant.

Career Highlights

Noboru Morita's career includes pivotal roles at renowned companies such as NEC Electronics Corporation and Fujitsu Corporation. His expertise and innovative approaches have positioned him as a key figure in technological advancements in Japan.

Collaborations

Throughout his career, Morita has collaborated with skilled professionals, including Tatsuya Usami and Koichi Ohto. These partnerships have fostered an environment of creativity and innovation, driving forward the development of new technologies and solutions.

Conclusion

Noboru Morita stands out as a remarkable inventor whose work has had a profound impact on communication and semiconductor technologies. His 21 patents underscore his innovative prowess and dedication to advancing technology. As industries continue to evolve, Morita's contributions will likely remain influential in shaping the future of communication and electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…