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For the Inventor, By the Inventor

Suwon, South Korea

No-Hyun Huh

This inventor holds 5 USPTO granted patents and 2 published patent applications. Top assignees: Samsung Electronics Co., Ltd., Ulvac, Inc.. Active years: 2000-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: No-Hyun Huh. Retrieved from https://idiyas.com/inventor/no-hyun-huh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 80.0

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 21(Granted Patents)


Location History:

  • Yongin-shi, KR (2000)
  • Yongin-si, KR (2004)
  • Gyeonggi-do, KR (2009)
  • Suwon, KR (2009 - 2013)

Company Filing History:

goldMedal5 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal2 out of 447 
 
Ulvac, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2000-2013

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5 patents (USPTO):Explore Patents
1. 8361274 - Etching apparatus and etching method (2013-01-29),
2. 7560712 - Ion implanter with etch prevention member(s) (2009-07-14),
3. 7497963 - Etching method (2009-03-03),
4. 6835276 - Window for allowing end point of etching process to be detected and etching device comprising the same (2004-12-28),
5. 6114237 - Method of forming contacts for a semiconductor device (2000-09-05),

Title: No-Hyun Huh: Innovator in Vacuum Processing Technology

Introduction

No-Hyun Huh is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of vacuum processing technology, holding a total of 5 patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is an etching apparatus and etching method. This invention features a vacuum processing apparatus equipped with a vacuum processing tank. It includes a first gas introduction section that allows a first processing gas in a radical state to be introduced into the vacuum processing tank and guided to a semiconductor wafer. Additionally, a second gas introduction section is designed to introduce a second processing gas that reacts with the first processing gas, ensuring high-speed processing of multiple processing objects while maintaining in-plane uniformity after processing.

Another notable patent is an ion implanter with etch prevention members. This apparatus and method involve a process chamber where ion implantation occurs. It includes a support unit that holds the substrate and is electrically connected to a power source for generating high-frequency pulses. The conductive unit, separated from the support unit, generates plasma during the ion implantation process. This unit is equipped with an etch prevention member to protect it from being etched by the source gas used to generate the plasma.

Career Highlights

No-Hyun Huh has worked with leading companies in the industry, including Samsung Electronics Co., Ltd. and Ulvac, Inc. His experience in these organizations has allowed him to develop innovative solutions that address the challenges faced in semiconductor manufacturing.

Collaborations

He has collaborated with notable coworkers such as Ki-Young Yun and Il-Kyoung Kim, contributing to advancements in their respective fields.

Conclusion

No-Hyun Huh's contributions to vacuum processing technology and semiconductor manufacturing are noteworthy. His innovative patents and collaborations reflect his commitment to advancing the industry. His work continues to influence the development of efficient manufacturing processes in the semiconductor sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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