IDiyas

For the Inventor, By the Inventor

San Jose, CA, United States of America

Nipun Misra

USPTO Granted Patents = 12 

Average Co-Inventor Count = 7.2

ph-index = 4

Forward Citations = 347(Granted Patents)


Location History:

  • San Jose, CA (US) (2014 - 2017)
  • Emeryville, CA (US) (2017 - 2024)

Company Filing History:

goldMedal12 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2014-2024

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12 patents (USPTO):
1. 11935724 - Symmetric VHF source for a plasma reactor (2024-03-19),
2. 11587766 - Symmetric VHF source for a plasma reactor (2023-02-21),
3. 11043361 - Symmetric VHF source for a plasma reactor (2021-06-22),
4. 9824862 - Symmetric VHF source for a plasma reactor (2017-11-21),
5. 9721760 - Electron beam plasma source with reduced metal contamination (2017-08-01),
6. 9653267 - Temperature controlled chamber liner (2017-05-16),
7. 9443700 - Electron beam plasma source with segmented suppression electrode for uniform plasma generation (2016-09-13),
8. 9269546 - Plasma reactor with electron beam plasma source having a uniform magnetic field (2016-02-23),
9. 9129777 - Electron beam plasma source with arrayed plasma sources for uniform plasma generation (2015-09-08),
10. 8951384 - Electron beam plasma source with segmented beam dump for uniform plasma generation (2015-02-10),
11. 8920597 - Symmetric VHF source for a plasma reactor (2014-12-30),
12. 8734664 - Method of differential counter electrode tuning in an RF plasma reactor (2014-05-27),

Title: Nipun Misra: Innovator in Plasma Technology

Introduction

Nipun Misra is a prominent inventor based in San Jose, CA, known for his significant contributions to plasma technology. With a total of 12 patents to his name, he has made remarkable advancements in the field, particularly in the development of plasma sources.

Latest Patents

One of Nipun's latest patents is titled "Symmetric VHF Source for a Plasma Reactor." This invention pertains to a capacitively coupled plasma source where VHF power is applied through an impedance-matching coaxial resonator that features a symmetrical power distribution. This innovative approach enhances the efficiency and effectiveness of plasma reactors.

Career Highlights

Nipun Misra is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to focus on cutting-edge technologies that drive advancements in plasma applications.

Collaborations

Throughout his career, Nipun has collaborated with notable colleagues, including Kenneth S. Collins and James D. Carducci. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Nipun Misra's contributions to plasma technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the field. His ongoing efforts continue to shape the future of plasma applications.

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