The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2017

Filed:

Oct. 01, 2012
Applicants:

James D. Carducci, Sunnyvale, CA (US);

Kallol Bera, San Jose, CA (US);

Nipun Misra, San Jose, CA (US);

Larry D. Elizaga, Tracy, CA (US);

Inventors:

James D. Carducci, Sunnyvale, CA (US);

Kallol Bera, San Jose, CA (US);

Nipun Misra, San Jose, CA (US);

Larry D. Elizaga, Tracy, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32495 (2013.01); H01J 37/32522 (2013.01); Y10T 428/13 (2015.01); Y10T 428/21 (2015.01); Y10T 428/24273 (2015.01); Y10T 428/24479 (2015.01);
Abstract

A liner for a semiconductor processing chamber and a semiconductor processing chamber are provided. In one embodiment, a liner for a semiconductor processing chamber includes a body having an outwardly extending flange. A plurality of protrusions extend from a bottom surface of the flange. The protrusions have a bottom surface defining a contact area that is asymmetrically distributed around the bottom surface of the flange.

Published as:

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