The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2024
Filed:
Feb. 13, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kartik Ramaswamy, San Jose, CA (US);
Igor Markovsky, San Jose, CA (US);
Zhigang Chen, Campbell, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Nipun Misra, Emeryville, CA (US);
Leonid Dorf, San Jose, CA (US);
Zheng John Ye, Santa Clara, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32091 (2013.01); H01J 37/32018 (2013.01); H01J 37/32082 (2013.01); H01J 37/32183 (2013.01); H01J 37/32541 (2013.01); H01J 37/32568 (2013.01); H01J 37/32577 (2013.01); H01J 37/32587 (2013.01); H01J 37/32596 (2013.01); H01J 37/3266 (2013.01); H01J 37/32715 (2013.01); H01J 37/32834 (2013.01);
Abstract
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.